Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Producer SE SACVD

Asset ID: 190056

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Applied Materials (AMAT)

Producer SE SACVD

SACVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: October 9, 2013

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) B5.3_100   
System Power Rating  208 AC 3-Phase   
Loading Configuration  2 ENHANCED 25 WAFER FOUP V2 (LOADPORT)   
   Vendor Chm Model   
Chm/Unit Position   1  SACVD SE TWIN ATEOS,TEB,TEOP,O3,NF3    
Chm/Unit Position   2  SACVD SE TWIN BTEOS,TEB,TEOP,O3,NF3    
Description     Qty
Tool:      
Process Unit: SACVD SE Twin Pallet Model: (02) OXIDE BPSG Remark 1
Controller: N/A     1
MFC/Pressure Unit: N/A     2
Drive Mechanisms: N/A     2
FOUP Opener: TDK TAS300 series (include E99 Tag Reader)   2
Gas System:N/A     2
Exhuast System: Scrubber Zenith / Process pump iHs1000   1/2


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