Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials Endura II Aluminum Interconnect

Asset ID: 207036

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Applied Materials

Endura II Aluminum Interconnect

PVD (Physical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 2/26/2021

PVD - 15-3AMAT_END_REFLOW2 - ENDURA2 -


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.

Other missing or damaged parts: Not reported.


[Chamber 1]

For Ti/TiN PVD chamber,SIP

DCPS;Master,PINNACLE,AE,for PVD

    Slave,PINNACLE,AE,for PVD

RFPS;GHW-12,ENI,for Bias     

PUMP/CRYO,OBIS,HELIX

SLT ESC type stage

Ar;50/20sccm, N2;200sccm


[Chamber 2]

For Al-Cu PVD chamber,ALPS

DCPS;Master,OPTIMA DCG-200,ENI,for PVD

    Slave,OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

SLT ESC type stage

Ar;100/20sccm


[Chamber 3]

For Al-Cu PVD chamber

DCPS;Master,OPTIMA DCG-200,ENI,for PVD

    Slave,OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

HT ESC type stage

Ar;200/20sccm


[Chamber 4]

For Al-Cu PVD chamber

DCPS;Master,OPTIMA DCG-200,ENI,for PVD

    Slave,OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

HT ESC type stage

Ar;200/20sccm


[Chamber 5]

For Ti/TiN PVD chamber,SIP

DCPS;Master,PINNACLE,AE,for PVD

    Slave,PINNACLE,AE,for PVD

RFPS;GHW-12,ENI,for Bias     

PUMP/CRYO,OBIS,HELIX

SLT ESC type stage

Ar;50/20sccm, N2;200sccm


[Chamber C]

For Pre-CLN chamber,PCXT

RFPS;CDX-2000,13.56/2MHz,COMDEL,for BIAS/SLA

PUMP/TMP MAG1300,LEYBOLD.

Ar;200/20sccm


[Chamber D]

For TiN PVD chamber

DCPS;OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

A101 type stage

Ar/N2;150/200sccm


[Chamber E]

For Degas,Plate heater

PUMP/CRYO,HELIX ON-BOARD IS

Ar,press. Controlled


[Chamber F]

For Degas,Plate heater

PUMP/CRYO,HELIX ON-BOARD IS

Ar,press. Controlled

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