Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Tool Model | Producer SE | |||
Process | Nit | |||
Software Version (include revision #) | B3.7_64 | |||
System Power Rating | 200/208V AC 3-Phase for System | |||
Loading Configuration | 2 load port | |||
Vendor Chm Model | Chemicals / Gases Used | |||
Chm/Unit Position 1 | PE SiH4 TWIN | N2,SiH4,NF3,NH3,Ar,N2O,CO2,He,N2 | ||
Chm/Unit Position 2 | PE SiH4 TWIN | N2,SiH4,NF3,NH3,Ar,N2O,CO2,He,N2 |
The following Missing parts are from the only Chamber B. A photo for a list of missing parts from Chamber B is Available.
Chamber A is complete.
Description | Missing (Qty) | |
RPS GENERATOR, CIP, ASTRON 2L | 2 | |
CABLE, RESISTOR JUMP, GAS FEED THRU, COM | 2 | |
LID Fix Screw | 2 | |
ASSEMBLY, RF FILTER BOX, HIGH TEMP CONN | 1 | |
DRVR SERVO MOTOR 100W 200V DNET FIRMWARE | 1 | |
HARNESS ASSY, DUAL PIN LIFT DRIVE PWR AD | 1 | |
CNTRL TEMP DUAL 4DIG DSPL RED/GRN 1/16DI | 2 | |
HF-GEN | 2 | |
HF-GEN HOSE | 1 | |
RF FEEDTHROUGH, MFA, RF MATCH, PRODUCER | 1 | |
RPS HOSE | 2 | |
Teflon Insulator | 1 |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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