Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 7/24/2022
Missing or damaged parts: Fab15 confirmed there were no missing
or damaged parts.
Configuration & photos Available: For further details of the configuration,
please ask your sales person.
Vendor Chm Model
Chemicals / Gases Used
Chm/Unit Position 1
NanoCure UV Twin
N2,NF3,Ar,O3Ar
Chm/Unit Position 2
ETERNA FCVD Twin
N2,NF3,Ar,O2,TSA,He,NH3,H2O
Chm/Unit Position 3
ETERNA FCVD Twin
N2,NF3,Ar,O2,TSA,He,NH3,H2O
Refer to ADCS to extract the Doc 2 to update the Tool/System Configuration
accordingly.
System Configuration
Description
Tool:
Process Unit: N/A
Model:
Controller: N/A
MFC/Pressure Unit: STEC（Z700series）
Drive Mechanisms:
FOUP Opener: Sinfonia
Gas System: N/A
Exhuast System: N/A
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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