Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS

Asset ID: 209819

Print spec sheet

Tokyo Electron Ltd. (TEL)

CLEAN TRACK LITHIUS

Multi Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

PHOTO 15-3TEL_LI_CT_01 TEL LITHIUS CT


Tool has been de-installed and is stored in an off-site warehouse. No photos provided. Please inspect to collect photos.

Missing or damaged parts: Fab15 confirmed there were no missing or damaged parts.

BLOCK DIAGRAM AVAILABLE: PLEASE ASK YOUR SALES PERSON.


It is a dual-block tool.


[Track Config 1]

Coat cup:3

Developper cup:7


[Track Config 2]

Resist Reduction:RRC

Dev Nozzle: SH(2-4/2-5)

         NLD+LD(3-1~3-5)

Resist pump:RDS 10ml

FIRM NOZZLE:FIRM MIXING(3-1~3-5)


[Oven Config]

COT:CPHP x6


[Track Chemicals]

Resist supply:Gallon bottle

Thinner:NONE

DIW

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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