Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. Taiwan Branch - Wavetek

Applied Materials (AMAT) P-5000 Mark II MxP R2 Metal

Asset ID: 215002

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Applied Materials (AMAT)

P-5000 Mark II MxP R2 Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 1996

Currently Configured for: 150mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hsinchu 308, Taiwan

Available date: Currently Available

HARD DRIVE WILL BE REFORMATTED. OPERATING SOFTWARE IS NOT INCLUDED.

Inspect to confirm configuration and condition and missing and damaged parts.


Install Type:Through-the-wall

Software Version:E4.70

Date of Last PM:2021/10/25

Is System On-Line? No

Off-Line Date:2021/11/01


Decontamination Report Exists? No

Can Produce Wafers AS IS? Yes

All Cables Present? Yes

Etcher Mainframe Type:P5000 Mark II


System Configuration:Chamber Type

Position A:R2

Position B:R2

Position C:N/A

Position D:ASP


Directory of Etch Chamber Types:Process

R2:Metal Etch

ASP:Strip


Key Common Options :Included?

Electrostatic Chuck:No

Independent Backside He Cool:Yes

VDS (Vapor Delivery System):Yes

Signal Lamp Tower:No

Bolt-On-SMIF:No

Clean Room Manuals:Yes

Standard Manuals:Yes

Remote Service Monitors:Yes


Key P5000 Mainframe Items

Bolt-Down Lid:No

Storage Elevator:29 Slots

Expanded (20 Slot) VME:No

Floppy Drive Type:3 ½”

Mini-Controller:Yes

Gas Panel Type:28 line


MxP Chamber Items

RF Match Type:Phase IV

Lid Type:Clamp

Autobias:Yes

Endpoint:Standard

Chamber Liner:Yes

Cathode Type:Standard

Lid Gas Distribution:showerhead


ASP Chamber Items

Microwave Tuning:Manual

Wafer Holding:Basket

Applicator:Single


Remote Frame Status:Included?

Stand Alone Endpoint System:Yes 

RF Generator Rack:Yes

Remote Frame w/AC Box:Yes


Turbo Pump Details 

Chamber Position  Turbo Mfgr. Turbo Model

Position A  Htc     STP-301

Position B  Htc    STP-301

Position C  N/A     N/A

Position D  N/A     N/A


RF/Microwave Generator Details 

Chamber Position Mfgr. Model

Position A ENI  OEM-12B

Position B ENI  OEM-12B

Position C N/A  N/A

Position D ASTEX AX2115


Etch Chamber Roughing Pumps

Etch Chamber Pump

Manufacturer:EDWARDS

Model:QDP80/500

Quantity Required:2

Not Included With System


Ash/Strip Chamber Roughing Pump

Strip Chamber Pump

Manufacturer:EDWARDS

Model:QDP80/500

Quantity Required:1

Not Included With System


Load Lock Pump

Manufacturer:EDWARDS

Model:QDP80

Not Included With System


Neslab Chiller

Model:HX150

Quantity Required:1

Not Included With System


AMAT Heat Exchanger

Model:AMAT 1

Quantity Required:2

Not Included With System


Gas Box Configuration

Gas Line #  Gas   Flow (sccm)

1   BCL3  100

2   CL2   50

3   CF4   20

4   N2S   100

5   N/A

6   N/A

7   BCL3   100

8   CL2    50

9   CF4    20

10   N2S   100

11   N2S   1000

12   O2   5000

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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