Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Manassas, United States
Available date: Currently Available
| Tool Model | Vesta NV | |||
| Process | POLY | |||
| Software Version | Ver3.85-Rev501-STD-3.15a | |||
| System Power Rating | 200～208VAC 3-Phase | |||
| Loading Configuration | 3 Carrier Stage | |||
| Any equipment manuals
available? | ||||
| Tool under OEM service
contract? | ||||
| Description | Chemicals / Gases Used | |||
| Chm Position 1 | Tactras-VestaNV | Cl2/HBr/NF3/CF4/O2/SF6/Ar/O2/NF3 | ||
| Chm Position 2 | Tactras-VestaNV | Cl2/HBr/NF3/CF4/O2/SF6/Ar/O2/NF3 | ||
| Chm Position 3 | Tactras-RT3 | O2/N2 | ||
| Chm Position 4 | Tactras-RT3 | O2/N2 | ||
| Chm Position 5 | Tactras-VestaNV | Cl2/HBr/NF3/CF4/O2/SF6/Ar/O2/NF3 | ||
| Chm Position 6 | Tactras-VestaNV | Cl2/HBr/NF3/CF4/O2/SF6/Ar/O2/NF3 | ||
| Description | Qty | |||
| Loder Module | 1 | |||
| LoadPort Unit | 3 | |||
| VTM | 1 | |||
| LLM | 1 | |||
| VTM DRY PUMP | 1 | |||
| PM | 6 | |||
| GAS BOX | 6 | |||
| RF Generater | 6 | |||
| TMP controller | 6 | |||
| AC Distriction BOX | 3 | |||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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