Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)
Centris AdvantEdge G5 Mesa T2 Poly
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Manassas, United States
Available date: Currently Available
| Tool Model | Centris Mesa2 | ||
| Process | Centris Mesa2 POLY | ||
| Software Version | Cdr2.4_48 | ||
| System Power Rating | 208VAC 3-Phase | ||
| Loading Configuration | 4 Carrier Stage | ||
| Description | Chemicals / Gases Used | ||
| Chm Position 1 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 2 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 3 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 4 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 5 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 6 | Centris Mesa2 | O2/SF6/C4F6/CF4/CL2/HBr/SO2/CH2F2/BCL3/N2/CHF3/Ar/He | |
| Chm Position 7 | AxisWLL | 3%H2/N2 / O2 / N2 | |
| Chm Position 8 | AxisWLL | 3%H2/N2 / O2 / N2 | |
| System Configuration | Qty | ||
| Description | |||
| Tool: | 2 | ||
| AC Rack | 2 | ||
| Generator Rack | 2 | ||
| IPUP | 6 | ||
| WFIB | 1 | ||
| Monitor Stand | 1 | ||
| Side Strage | 1 | ||
| Main Frame with AxisWLL*2 | 6 | ||
| Centris Mesa2 | 1 | ||
| FI | |||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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