Macquarie Semiconductor and Technology on behalf of Macquarie Finance Korea Co., Ltd.
Centura AP AdvantEdge G5 Minos Poly
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: Apr 2015
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Gyeonggi-do,, Korea, Republic of
Available date: Currently Available
Poly Etch Centura AP SMBOM / Etch Centura AP Poly Fitem: SMBOM
2. SILICON AXIOM HT CHAMBER
3. CUSTOMER FAB OPTIONS
4. GAS PANEL OPTIONS - CL2 Purifier
5. MAINFRAME OPTIONS - Corrosion Resistant FI and SWLL
6. FACTORY INTERFACE OPTIONS
7. REMOTE OPTIONS - Voltage Sag Monitor
8. SYSTEM Items
9. NON STANDARD REQUEST
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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