Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Singapore, Singapore

Available date: Currently Available

Inspect to confirm configuration and condition.

Units are store in separate location.

Equipment configuration ：

(1) CSB (2) T-Block1 (3) T-Block2

(4) HP Tower1 (5) HP Tower2 (6) HP Tower3

(7) IRAM (8) IRAS (9) COT Cabinet

(10) DEV Cabinet (11) CUP THC (12) AC power box

1) Serial number: G250315

2) Main Controller type: LITHIUS ES

3) Vintage: 17

4) MC configuration (#COT/#DEV): 3 COT+2BCT+5 DEV

5) Stepper/Scanner interface:

6) Wafer Direction ( R to L or L to R): L to R

Accessory

1) AC Power box: YES

-- AC Power cable: 3 phase

2) TCU: YES

3) T & H : YES

-- Model/Make: ASAHI

4) Chemical Cabinet: COT + DEV

7) COATER Units

1) Unit

• Resist Nozzles (Qty): 8
  • Resist Pumps (type): HPT
  • EBR/RRC/BSR: EBR+RRC+Back rinse
  • Temp/Humidty Sensor: YES
  • PR auto exchange system: NO
  • Photo resist temperature control installed: YES
  • Motor Flange temperature control installed: YES
  • Photo resist drain type:

2)2-2 Unit

• Resist Nozzles (Qty): 8
  • Resist Pumps (type): HPT
  • EBR/RRC/BSR: EBR+RRC+Back rinse
  • Temp/Humidty Sensor: YES
  • PR auto exchange system: YES
  • Photo resist temperature control installed: YES
  • Motor Flange temperature control installed: YES
  • Photo resist drain type: FOC center

3) 2-3 Unit

• Resist Nozzles (Qty): 8
  • Resist Pumps (type): HPT
  • EBR/RRC/BSR: EBR+RRC+Back rinse
  • Temp/Humidty Sensor: YES
  • PR auto exchange system: YES
  • Photo resist temperature control installed: YES
  • Motor Flange temperature control installed: YES
  • Photo resist drain type:

8) Develop Units

1) 1-3 Unit

• Develop Nozzle type: LD
  • Develop Nozzle Move type: Left to Right
  • Rinse: 2 Top rinse
  • Developer Temp control Installed: YES
  • Auto damper Installed: YES
  • Auto dummy rinse installed: NA
  • Cup type: STD DEV cup

2)3-3 Unit

• Develop Nozzle type: LD
  • Develop Nozzle Move type: Left to Right
  • Rinse: 2 Top rinse
  • Developer Temp control Installed: YES
  • Auto damper Installed: YES
  • Auto dummy rinse installed: NA
  • Cup type: STD DEV cup

3) 3-4 Unit

• Develop Nozzle type: LD
  • Develop Nozzle Move type: Left to Right
  • Rinse: 2 Top rinse
  • Developer Temp control Installed: YES
  • Auto damper Installed: YES
  • Auto dummy rinse installed: NA
  • Cup type: STD DEV cup

9) All Unit's Qty

• Coater units: 3
• Develop units: 5
• CHP units: 13(CPHP)
• LHP units: 5
• HHP units: NA
• PHP units: NA
• CPL units: 7
• ADH units: 2
• TRS units: 2
• WEE units: 1
• PEB units: 5
• FFB units: NA
• RDW units: NA
• IRA Block: Y
• CSB: Y
• CWH: N
• CWD: N
• TRS: Y

Damage/Missing parts list

Please inspect tool to reconfirm