Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Dainippon Screen Mfg. Co. (DNS) SU-3000

Asset ID: 207049

Print spec sheet

Dainippon Screen Mfg. Co. (DNS)

SU-3000

Single Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 12/15/2021

WET - 15-3DNS_SU3_WWSSG4 - SU3000 -


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.

Other missing or damaged parts: Not reported.


[Chamber A]

 Chemical : AM1(NH4OH/DIW/OTHERS) 70deg

 SPRAY : NANO SPRAY N2 5~20L/min

 Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ

 Spin DRY : N2 100l/min with shield plate, 2500rpm


[Chamber B]

 Chemical : DHF(1:300) 23deg,

 SPRAY : NANO SPRAY N2 5~20L/min

 Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ

 Spin DRY : N2 100l/min with shield plate, 2500rpm


[Chamber C]

 Chemical : AM1(NH4OH/DIW/OTHERS) 70deg

 SPRAY : NANO SPRAY N2 5~20L/min

 Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ

 Spin DRY : N2 100l/min with shield plate, 2500rpm


[Chamber D]

 Chemical : DHF(1:300) 23deg,

 SPRAY : NANO SPRAY N2 5~20L/min

 Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ

 Spin DRY : N2 100l/min with shield plate, 2500rpm



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