Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)

Applied Materials (AMAT) Centura AP DPS AdvantEdge G2 Poly

Asset ID: 55307

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Applied Materials (AMAT)

Centura AP DPS AdvantEdge G2 Poly

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: May, 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Manassas, United States

Available date: Currently Available

Tool ModelCentura AP AdvancedEdge G2  
ProcessCentura G2 POLY  
Software VersionAMS 2.5_45  
System Power Rating 208VAC 3-Phase   
Loading Configuration2 Carrier Stage  
 DescriptionChemicals / Gases Used
Chm Position   1 & 2Centura G2HBR/CL2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43
Chm Position   3Centura Axiom3%H2/N2 /O2/N2
   
    
    
    
    
System Configuration   
DescriptionQty  
    
Main AC Rack1  
Secondary AC Rack1  
IPUP1  
WFIB2  
Endpoint stand1  
Monitor stand1  
Side strage Left1  
Side strage Right1  
Main frame1  
DPS G22  
Axiom1  
FI1  


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