Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: 2010
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Manassas, United States
Available date: Currently Available
| Tool Model | Centura AP AdvancedEdge G5 | |
| Process | Centura G5 POLY | |
| Software Version | AMS 2.6_48 | |
| System Power Rating | 208VAC 3-Phase | |
| Loading Configuration | 3 Carrier Stage | |
| Description | Chemicals / Gases Used | |
| Chm Position 1 | Centura G5 | HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43 |
| Chm Position 2 | Centura G5 | HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43 |
| Chm Position 3 | Centura G5 | HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43 |
| Chm Position 4 | Centura Axiom | 3%H2/O2 /O2/N2 |
| System Configuration | ||
| Description | Qty | |
| Main AC Rack | 1 | |
| Secondary AC Rack | 1 | |
| IPUP | 1 | |
| WFIB | 3 | |
| Endpoint stand | 1 | |
| Monitor stand | 1 | |
| Side strage Left | 1 | |
| Side strage Right | 1 | |
| Main frame | 1 | |
| DPS G5 | 3 | |
| Axiom | 1 | |
| FI | 1 |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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