Macquarie Semiconductor and Technology on behalf of Macquarie Finance Korea Co., Ltd.
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Centura AP AdvantEdge G5 Mesa Poly
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: Dec 2014
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Gyeonggi-do,, Korea, Republic of
Available date: Currently Available
1. Application
· 1 * Etch Centura AP 3 Silicon AdvantEdge G5 Minos/1AxP Application Package
· 3 * W Gate Application
· 1 * Post Etch Application
2. SILICON AXIOM HT CHAMBER
· 1 * CCM Cover
· 1 * Ch AC Cover
3 * Silicon Advantedge G5 Mino Chamber
3 * MEsa Source
1 * AdvantEdge G5 Minos Swap Kit
3. CUSTOMER FAB OPTIONS
· 1 * Fast eDiagnostic Sys Interface
· 1 * Fast Data Gateway
4. GAS PANEL OPTIONS - CL2 Purifier
5. MAINFRAME OPTIONS - Corrosion Resistant FI and SWLL
6. FACTORY INTERFACE OPTIONS
· 1 * Right Side Storage Pod
· 1 * Left Side Storage Pod
· 1 * 3 Load Ports
· 1 * Interface A Option
· 3 * Infopad Pos A or B
· 3 * Operator Access Switch
1 * Front Facing Intake Plenum
7. REMOTE OPTIONS - Voltage Sag Monitor
8. SYSTEM Items
· 1* Mainframe Lifting sling FIF kit
9. NON-STANDARD REQUEST
Beta Software
3 * DUV Upgrade (ADDL-00312950)
CONFIGURED CENTURA AP l 6STK POLY ETCH CL2 FILTER D
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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