Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. - UMC

Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS

Asset ID: 207241

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Tokyo Electron Ltd. (TEL)

CLEAN TRACK LITHIUS

Multi Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Singapore, Singapore

Available date: Currently Available

HARD DRIVE WILL BE REFORMATTED. OPERATING SOFTWARE IS NOT INCLUDED.


Inspect to confirm configuration and condition.

Units are store in separate location.

Equipment configuration :

(1) CSB (2) T-Block1 (3) T-Block2

(4) HP Tower1 (5) HP Tower2 (6) HP Tower3

(7) IRAM (8) IRAS (9) COT Cabinet

(10) DEV Cabinet (11) CUP THC (12) AC power box


1) Serial number: G250315

2) Main Controller type: LITHIUS ES

3) Vintage: 17

4) MC configuration (#COT/#DEV): 3 COT+2BCT+5 DEV

5) Stepper/Scanner interface:

6) Wafer Direction ( R to L or L to R): L to R

Accessory

1) AC Power box: YES

-- AC Power cable: 3 phase

2) TCU: YES

3) T & H : YES

-- Model/Make: ASAHI

4) Chemical Cabinet: COT + DEV

7) COATER Units

1) Unit

  • Resist Nozzles (Qty): 8
    • Resist Pumps (type): HPT
    • EBR/RRC/BSR: EBR+RRC+Back rinse
    • Temp/Humidty Sensor: YES
    • PR auto exchange system: NO
    • Photo resist temperature control installed: YES
    • Motor Flange temperature control installed: YES
    • Photo resist drain type:


2)2-2 Unit

  • Resist Nozzles (Qty): 8
    • Resist Pumps (type): HPT
    • EBR/RRC/BSR: EBR+RRC+Back rinse
    • Temp/Humidty Sensor: YES
    • PR auto exchange system: YES
    • Photo resist temperature control installed: YES
    • Motor Flange temperature control installed: YES
    • Photo resist drain type: FOC center


3) 2-3 Unit

  • Resist Nozzles (Qty): 8
    • Resist Pumps (type): HPT
    • EBR/RRC/BSR: EBR+RRC+Back rinse
    • Temp/Humidty Sensor: YES
    • PR auto exchange system: YES
    • Photo resist temperature control installed: YES
    • Motor Flange temperature control installed: YES
    • Photo resist drain type:


8) Develop Units

1) 1-3 Unit

  • Develop Nozzle type: LD
    • Develop Nozzle Move type: Left to Right
    • Rinse: 2 Top rinse
    • Developer Temp control Installed: YES
    • Auto damper Installed: YES
    • Auto dummy rinse installed: NA
    • Cup type: STD DEV cup


2)3-3 Unit

  • Develop Nozzle type: LD
    • Develop Nozzle Move type: Left to Right
    • Rinse: 2 Top rinse
    • Developer Temp control Installed: YES
    • Auto damper Installed: YES
    • Auto dummy rinse installed: NA
    • Cup type: STD DEV cup


3) 3-4 Unit

  • Develop Nozzle type: LD
    • Develop Nozzle Move type: Left to Right
    • Rinse: 2 Top rinse
    • Developer Temp control Installed: YES
    • Auto damper Installed: YES
    • Auto dummy rinse installed: NA
    • Cup type: STD DEV cup


9) All Unit's Qty

  • Coater units: 3
  • Develop units: 5
  • CHP units: 13(CPHP)
  • LHP units: 5
  • HHP units: NA
  • PHP units: NA
  • CPL units: 7
  • ADH units: 2
  • TRS units: 2
  • WEE units: 1
  • PEB units: 5
  • FFB units: NA
  • RDW units: NA
  • IRA Block: Y
  • CSB: Y
  • CWH: N
  • CWD: N
  • TRS: Y


Damage/Missing parts list

Please inspect tool to reconfirm

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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