Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Endura II Front-End Metallization
PVD (Physical Vapor Deposition)
Date of Manufacture:
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 9/16/2022
PVD 15-3AMAT_ENDURA2_CO_01 AMAT ENDURA 2 CO
| OEM | AMAT | ||
| Tool Model | ENDURA | ||
| Process | Metal (Co) | ||
| Software Version (include revision #) | eentB5.0_149 | ||
| System Power Rating | 1 x 400VAC and 1 x 208VAC | ||
| Loading Configuration | 3 Load Ports | ||
| Vendor Chm Model | Chemicals / Gases Used (not to use Micron Proprietary names) | ||||
| Chm/Unit Position 1 | ALPS-Co | PAr | |||
| Chm/Unit Position 2 | ALPS-Co | PAr | |||
| Chm/Unit Position D | PCXT | PAr | |||
| Chm/Unit Position E | Degas | PAr | |||
| Chm/Unit Position F | Degas | PAr | |||
| Tool: | ||||
| Process Unit: | Model: | Remark | ||
| Controller: | FES (CPCI) | |||
| MFC/Pressure Unit: | AERA DN780 200sccm/100sccm/20sccm | |||
| Drive Mechanisms: | NA | |||
| FOUP Opener: | TDK (TAS-300) | |||
| Gas System: | NA | |||
| Exhuast System: | NA | |||
Fab15 confirmed there were no missing or damaged parts.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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