Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (Boise)
Centura AP DPS AdvantEdge G2 Metal - Chamber Only
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: 2007
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Boise, United States
Available date: Currently Available
Tool Status: installed and powered up in the fab
Configuration. Audit to verify.
DRY ETCH - 04-3APPLIED_G2MTL_0300 - MTL
Additional Information:
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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