Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. Taiwan Branch - UMC
WCVD (Chemical Vapor Deposition)
Date of Manufacture: 2014
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Tainan 744, Taiwan
Available date: Currently Available
Inspect to confirm configuration and condition.
Configuration :
Software Version : 192.168.1.99
System is on-line
Can produce wafers as is
All Cables are present
Primary user interface loc on the right
The chamber pump is Edwards-TXH1210*1ea
The WTS pump is Edwards-TXH1820
Gas Box Configuration :
Gas Line Gas Flow(sccm) MFC(Mfgr.) MFC(Model)
1 Ar 20000 Brooks GF125
2 SiH4 500 Brooks GF125
3 H2 30000 Brooks GF125
4 Ar 20000 Brooks GF125
5 WF6 500 Brooks GF125
B N2 10000 Brooks GF125
C Ar 20000 Brooks GF125
8 Ar 20000 Brooks GF125
D Ar 5000 Brooks GF125
E WF6 5000 Brooks GF125
F Ar 5000 Brooks GF125
G SiH4 500 Brooks GF125
I NF3 10000 Brooks GF125
J WF6 500 Brooks GF125
K WF6 500 Brooks GF125
X 5%B2H6/N2 500 Brooks GF125
N 5%B2H6/N2 750 Brooks GF125
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
Get in touch
Ask about our equipment solutions, ranging from Macquarie equipment inventory sales, sourcing programs, surplus disposition options, and direct equipment purchases.