Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) CLEAN TRACK ACT 12

Asset ID: 141021

Print spec sheet

Tokyo Electron Ltd. (TEL)

CLEAN TRACK ACT 12

Single Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture: September, 2003

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available


Tool has been de-installed and is stored in an off-site warehouse. Tool is barrier-bagged and skidded.

Packing list for barrier-bagged tool Available. Please refer to PDF version's packing list for tool's removal from warehouse.

Missing or damaged parts: Fab15 confirmed there were no missing or damaged parts.


[Track Config 1]

PCT cup:1

Developper cup:2


[Track Config 2]

Resist Reduction:NONE

Dev Nozzle:H NOZZLE

Resist pump:ENCOMPASS


[Oven Config]

CHP x3

CPL x2


[Track Chemicals]

Resist supply:Gallon bottle,

Thinner:OK73


[Option]

PCT Pump is Encompass of Entegris.


BLOCK DIAGRAM AVAILABLE: PLEASE SEE.

Number of photoresist pumps configured with this TEL ACT 12? : Encompass pump×1

The main controller type? : Type Three (3)


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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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