Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: 2014
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Missing or damaged parts: Fab15 confirmed there are no missing or damaged parts.
| OEM | LAM | ||
| Tool Model | Kiyo EX e5 | ||
| Process | Poly | ||
| Software Version (include revision #) | 1.8.4_SP8-HF5 | ||
| System Power Rating | 200 AC 3-Phase | ||
| Loading Configuration | 4 load ports | ||
| Vendor Chm Model | Chemicals / Gases Used (not to use Micron Proprietary names) | ||||
| Chm/Unit Position 1 | Kiyo EX | SiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2 | |||
| Chm/Unit Position 2 | Kiyo EX | SiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2 | |||
| Chm/Unit Position 3 | Kiyo EX | SiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2 | |||
| Chm/Unit Position 4 | Kiyo EX | SiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2 | |||
| Chm/Unit Position 5 | Kiyo EX | SiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2 | |||
N2 Load Port Exists: YES.
N2 Load Port Vendor: 2nd Vender JUSTEM.
For more details, please see configuration.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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