Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
CVD - 15-3TEL_TRIAS_WSI - TRIAS -
Tool has been de-installed and is stored in an off-site warehouse.
A HARD DISK DRIVE WILL BE REMOVED FROMM TOOL.
OTHER DAMAGED OR MISSING PARTS REPORTED. PLEASE SEE THE LIST ATTACHED.
Trias[3ch]
[Chamber A]
Process: WSi
Hard: CVD
Gas(sccm): WF6(6/20), ClF3(500), Ar(500), SiH2Cl2(1000), Ar(500), Ar(200)
[Chamber B]
Process: WSi
Hard: CVD
Gas(sccm): WF6(6/20), ClF3(500), Ar(500), SiH2Cl2(1000), Ar(500), Ar(200)
[Chamber C]
Process: WSi
Hard: CVD
Gas(sccm): WF6(6/20), ClF3(500), Ar(500), SiH2Cl2(1000), Ar(500), Ar(200)
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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