Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Centura AP AdvantEdge G5 Metal

Asset ID: 209788

Print spec sheet

Applied Materials (AMAT)

Centura AP AdvantEdge G5 Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: October 2010

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) AMS 2.8_82

System Power Rating 208VAC 3-Phase

Loading Configuration 2 Carrier Stage


Vendor Chm Model     Chemicals / Gases Used

Chm/Unit Position  1  Centura G5  BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43

Chm/Unit Position  2  Centura G5 BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43

Chm/Unit Position  3  Centura Asp CF4/O2/N2

Chm/Unit Position  4  Centura Asp CF4/O2/N2


Main AC Rack

Secondary AC Rack

IPUP

WFIB

Endpoint stand

Monitor stand

Side strage Left

Side strage Right

Main frame

DPS G5

Asp

FI

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