Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Centura AP AdvantEdge G5 Metal
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: October 2010
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Software Version (include revision #) AMS 2.8_82
System Power Rating 208VAC 3-Phase
Loading Configuration 2 Carrier Stage
Vendor Chm Model Chemicals / Gases Used
Chm/Unit Position 1 Centura G5 BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43
Chm/Unit Position 2 Centura G5 BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43
Chm/Unit Position 3 Centura Asp CF4/O2/N2
Chm/Unit Position 4 Centura Asp CF4/O2/N2
Main AC Rack
Secondary AC Rack
Side strage Left
Side strage Right
|Description||Missing (Qty)||Defective (Qty)||Cannibalized (Qty)|
|SINGLE RING CERAMIC .50 HEIGHT 300MM HTD ESC||3||0||0200-04877 expendable Single ring|
Please inspect to confirm any other missing or damaged parts.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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