Macquarie Equipment Trading on behalf of Micron Technology, Inc. (Boise)

Varian Semiconductor Equipment Associates VIISta PLAD

Asset ID: 19095

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Varian Semiconductor Equipment Associates

VIISta PLAD

High Dose Implant

Ion Implanters

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Boise, United States

Available date: Currently Available

Tool Status:  In production

Configuration.  Audit to verify.

To include the following:
 
*VIISTa PLAD 200mm Single Wafer Pulsed Plasma Doping System
*All upgrade equipment required to successfully upgrade system
from 200mm to 300mm
including:
*300mm Wafer Size Conversion
*New 300mm Diborane RF Process Chambers
*New DC Power Supplies Which will enable the use of higher pulse
width and pulse frequency than that currently demonstrated on
the current Fab 4 tool.  The DC supplies will be capable of
pulse widths of up to 200µs at a voltage of 10kV, and pulse
frequency of up to 10KHz at a voltage of 10kV.
*300mm Small WIP Buffer
 
Modification in 2007:  ABTMC0511 (BF3 Process Chamber, PLAD
 

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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