Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) Telius SP-305 SCCM

Asset ID: 12333

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Tokyo Electron Ltd. (TEL)

Telius SP-305 SCCM

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2007

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) Ver2.90-Rev009b-VSTD3.30d  
System Power Rating  AC200V 3-Phase  
Loading Configuration  3Load port  
   Vendor Chm ModelChemicals / Gases Used 
Chm/Unit Position   1  Loder Module  
Chm/Unit Position   2  Process ship 1Ar,C4F8,C5F8,Xe,O2,CF4,CHF3,CH2F2,N2,CO,He,C4F6
Chm/Unit Position   3  Process ship 2Ar,C4F8,C5F8,Xe,O2,CF4,CHF3,CH2F2,N2,CO,He,C4F6
Process Unit:SCCM-Oxide  Model:Remark 
Controller:EC,MC  EC
MC
  
MFC/Pressure Unit:  FCS-DN
FCSWR-DN
627BRETDD2P
627B11TDC2P
  
Drive Mechanisms:  x-axis: linear motor
y-axis, z-axis, θ: AC servo motor
  
FOUP Opener:  FOUP 300E-C-EM001  
Gas System:  Accumulation type(12line) Fujikin 
Exhuast System:  TMP(FT-3301(MITSUBISHI))
DRY Pump(MU300-063)
  
ローダー モジュール(LM1    
プロセス シップ(PS)2    
ガス ボックス(GB)2    
パワー ラック1    
RF電源(Top 60MHz Daihen)2    
RF電源(Btm 2MHz Daihen)2    
チラー (UBRPD5A-2T2 Daikin)2    


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