Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Date of Manufacture: January, 2008
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 10/9/2023
Fab15 confirmed there were no missing or damaged parts.
| Item | Type | AMLKK4KQ (CMP417) | ||
| Tool Type | Reflexion Reflexion-LK Reflexion-LK Prime | Reflexion-LK | ||
| Polisher | LCWE (Load Cup) | Exchanger Input/Output Stage | Water pressure detection type + surface spray | |
| Head wash kit | Yes | |||
| Gap wash kit | Yes | |||
| Pedestal | Ring shape | |||
| Wash Tower | None | |||
| HCLU nozzle type | ||||
| Head Rince nozzle type | ||||
| UPA | Type | MKS / SMC | MKS G4 PLUS | |
| Vacuum Speed Controller | None | |||
| HEAD | 3Zone/5Zone/Metal | 5 Zone | ||
| 6 Carriage | ||||
| Ring Type | SUS+PPS | |||
| Speed controller | Enable | |||
| Wafer loss sensor | Dark pad | |||
| Pad Cond | Head Assy | LD Pad condition disk detect UP/DOWN detect on disk rotation | ||
| Disk clean cup | None (DIW spray come out from the side and bottom) | |||
| Platen | End Point System | Torque Monitor kit | Yes | |
| FULL VISION | None | |||
| RTPC | None | |||
| Slurry Arm | TSDA | |||
| High Pressure Rinse | Normal or High Flow | High Flow | ||
| Slurry Delivery | Platen1 - Line1 | D4505 | ||
| Platen1 - Line2 | - | |||
| Platen1 - Line3 | - | |||
| Platen1 - Line4 | - | |||
| Platen2 - Line1 | D4505 | |||
| Platen2 - Line2 | STI2401 | |||
| Platen2 - Line3 | - | |||
| Platen2 - Line4 | STI2910 | |||
| Platen3 - Line1 | D4505 | |||
| Platen3 - Line2 | STI2401 | |||
| Platen3 - Line3 | - | |||
| Platen3 - Line4 | STI2910 | |||
| Platen4 - Line1 | None | |||
| Platen4 - Line2 | None | |||
| Platen4 - Line3 | None | |||
| Platen4 - Line4 | None | |||
| Flow Controll | Tubing Pomp Flow Controller | Flow Controller | ||
| Slurry Supply-1 | Maker | Toyoko kagaku | ||
| Chem Type | D4505 | |||
| Pomp Type | Levitro Pomp | |||
| Modifed Filter Line | ||||
| Slurry Supply-2 | Maker | Toyoko kagaku | ||
| Chem Type | Sti2401 | |||
| Pomp Type | Levitro Pomp | |||
| Slurry Supply-3 | Maker | Toyoko kagaku | ||
| Chem Type | Sti2910 | |||
| Pomp Type | Levitro Pomp | |||
| Slurry Supply-4 | Maker | |||
| Chem Type | - | |||
| Pomp Type | ||||
| Slurry Supply-5 | Maker | |||
| Chem Type | - | |||
| Pomp Type | ||||
| Chiller | None | |||
| Chiller type (Vender,type) | ||||
| Wash Tower | None | |||
| QWE | Installed | None | ||
| Shield | None | |||
| Stationary Platen Shield | ||||
| Clenaer | Input Station | Pass thru Station Design | 1Piece | |
| Megasonic | Wafer Rotation | Roller | 0040-87416 (Amat Original) | |
| Flow Meter | Spray DIW | - | ||
| Brush | Brush unit | Wafer rotation | 2 Roller + 1 Idler | |
| Brush drive | Direct Drive | |||
| Brush gap adjustment | motor encoder | |||
| Brush opening adjustment | Gap Motor + Recipe controll | |||
| Chemical Delivery | Meｇ-1 | - | ||
| Meｇ-2 | - | |||
| Brush 1（Chem) | Mixed | |||
| Brush 1-1 | FPM | |||
| Brush 1-2 | NH4OH | |||
| Brush 2-1 | FPM | |||
| Brush 2-2 | - | |||
| Flow Meter | Brush1 Chem | Entegris Flow Controller | ||
| Brush1 Spray DIW | Entegris Flow Controller | |||
| Brush1 Brush Inner Rinse | Entegris Flow Controller | |||
| Brush2 Chem | Entegris Flow Controller | |||
| Brush2 Spray DIW | Entegris Flow Controller | |||
| Brush2 Brush Inner Rinse | Entegris Flow Controller | |||
| Wafer Rotation | Idler | "Only the washer part can be replaced + No inner ring " | ||
| Wafer Roller | Amat | |||
| Dryer | Drying | Method | IPA drying | |
| Hardware | SRD, IPA Vapar | IPA | ||
| SRD Sheald | NA | |||
| Heater On Detect Hardware | NA | |||
| Flow Meter | SRD Front | NA | ||
| SRD Rear | NA | |||
| Robot | FI | FFU | Differential pressure adjust type (manual mode possible) | |
| Maker (Type) | Kawasaki | |||
| Wafer Holding mechanism | Plunger | |||
| Wet Robot | Maker (Type) | kawasaki | ||
| Wafer Holding mechanism | Plunger | |||
| Cleaner Transfer | Walking beam Running beam | Running Beam | ||
| R/B Speed controller | Yes/No | No | ||
| Other | iAPC | Yes | ||
| NOVA | Type | 3060 / 3090 / i500 / i500+ | Nova i550 | |
| Algorithm | Cognex License ON/OFF | ON | ||
| Fire extinguisher | COX-3EN2 | COX-3EN2 | ||
| Pre Clean Unit | Unit /Rev | None | ||
| Chemical | - | |||
| Tool Clean | Door Shower | Reflexion , Reflexion-LK | None | |
| High Pressure Rinse | Yes | |||
| Clear Padcond Cover | None | |||
| Soft Ver | Gen (For only Prime) | Gen3, Gen4, etc | N/A | |
| Reflexion Ver. | Lk-lp3B4.4t_9 | |||
| MESA Ver. | ||||
| ISRM Ver. | IB21e5 | |||
| Full Vision | N/A | |||
| RTPC Ver. | - | |||
| APC Ver. | B3.1 | |||
| Nova IM Ver. | V4.5R6b65 | |||
| Nova Mars.Ver. | 5 | |||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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