Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Producer GT PECVD Silane

Asset ID: 210838

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Applied Materials (AMAT)

Producer GT PECVD Silane

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 1/20/2023

Tool Model  Producer GT  
Process  Bdi/Fresco  
Software Version (include revision #)B3.6_45  
System Power Rating 200 AC 3-Phase  
Loading Configuration 4 load port  
Tool under OEM service contract?   Yes  
Ch-B/C was converted from BLOK to Fresco  
   Vendor Chm ModelChemicals / Gases Used
Chm/Unit Position   1 BDiNF3,Ar,He,OMCTS,O2,N2
Chm/Unit Position   2 FrescoSiH4,TMS,NH3,NF3,Ar,He,O2,N2,N2O
Chm/Unit Position   3 FrescoSiH4,TMS,NH3,NF3,Ar,He,O2,N2,N2O


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