Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Producer SE APF

Asset ID: 209806

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Applied Materials (AMAT)

Producer SE APF

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 11/2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) B3.7_64 
System Power Rating  208 AC 3-Phase 
Loading Configuration  2 ENHANCED 25 WAFER FOUP V2 (LOADPORT) 
Chm/Unit Position   1  PE CARBON TWIN AC3H6,He,O2,Ar   
Chm/Unit Position   2  PE CARBON TWIN BC3H6,He,O2,Ar   
Chm/Unit Position   3  PE CARBON TWIN CC3H6,He,O2,Ar   
Process Unit: (XJ) PE Silane SE Twin Pallet Model: (75) APF Remark
Controller: N/A    
MFC/Pressure Unit: N/A    
Drive Mechanisms: N/A    
FOUP Opener: TDK TAS300 series (include E99 Tag Reader)  
Gas System:N/A    
Exhuast System: Scrubber Zenith / Process pump iHs1000F  


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