Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
PECVD (Chemical Vapor Deposition)
Date of Manufacture: 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
CVD 15-3AMAT_PRODSE2_ACW AMAT
A Hard Disk Drive will be removed from tool.
Other missing or damaged parts: Not reported.
[Chamber A]
Chamber Type:APF
Gas Config(sccm)=MFC Full Scale
C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/HE(5000)/O2(10000)/Ar(10000)/N2(15000)/He(1000)
RF HF 13.56MHz, max 3kW
Remote plasma 400kHz,max 10kW
[Chamber B]
Chamber Type:APF
Gas Config(sccm)=MFC Full Scale
C3H6(3000)/NF3(1000)/O2(15000)/AR(10000)/HE(5000)/O2(10000)/Ar(10000)/N2(15000)/He(1000)
RF HF 13.56MHz, max 3kW
Remote plasma 400kHz,max 10kW
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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