Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Centura AP AdvantEdge G5 Metal


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Asset ID: 210308

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Applied Materials (AMAT)

Centura AP AdvantEdge G5 Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2010-01-01

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

OEM  Applied Materials
Tool Model  Centura AP AdvantEdge G5
Process  Metal
Software Version (include revision #) AMS 3.5_105
System Power Rating  208VAC 3-Phase
Loading Configuration  3 Carrier Stage
   Vendor Chm ModelChemicals / Gases Used (not to use Micron Proprietary names)
Chm/Unit Position   1  Centura G5BCL3,CL2,O2.N2,SF6,CHF3,CF4,AR
Chm/Unit Position   2  Centura G5BCL3,CL2,O2.N2,SF6,CHF3,CF4,AR
Chm/Unit Position   3  ASPCF4,O2,N2 
Chm/Unit Position   4  ASPCF4,O2,N2 

Process Unit:Centura  Model:G5
Drive Mechanisms:YASKAWA FI Robot  
FOUP Opener:refarence picture   
Gas System:MFC/FRC   

Missing parts:

PN : 0190-28788 (There are multiple parts No. 0190-08825,0190-27340,0190-30906)


Qty : 1

Fab15 confirmed there were no damaged parts.

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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