Macquarie Semiconductor and Technology on behalf of Qorvo US, Inc.

Hitachi (Semiconductor) HL-800D

Asset ID: 209018

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Hitachi (Semiconductor)

HL-800D

E-beam Lithography System

Lithography Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: To be determined

Current Equipment Status: Available

Location of Equipment: Richardson, United States

Available date: Currently Available

In production until January 30, 2021.


The HL-800D system has the following features for high-speed and accuracy:

(1) a maximum beam size of 5 micrometers square with a current density of 10 A/cm2 at 50 kV acceleration;

(2) a high- speed and high-accuracy, three-stage electron-beam deflection-control system; and

(3) a continuous writing method to help eliminate stage-overhead time. The throughput of this system typically exceeds ten to fifteen wafers per hour for a quarter-micron pattern, though the speed depends on the total number of shots per wafer. 

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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