Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
Tactras Vigus RK3 - Chamber Only
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
(1 Chamber); Process OX. It has been removed from tool and is stored in clean room.
1 CHAMBER ONLY.
| Tool Model | Vigus RK3 |
| Process | OX |
| Software Version | Ver5.35-Rev502-STD-5.35a |
| System Power Rating | 200VAC 3-Phase |
| Chm Position 1 | TACTRAS Vigus RK3 | Ar/H2/C4F8/O2/CF4/CHF3/CH2F2/CO/N2/C4F6/COS | |
CONFIGURATION AVAILABLE: Please ask your sale person.
No missing parts reported.
Shipping wheels will be needed for rigging out of clean room. Please inspect to confirm.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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