Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Tactras Vigus RK3 - Chamber Only
Etch/Ash/Clean - Plasma Processing
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
One Chamber only. It is stored in an off-site warehouse. No photos provided by FAb15. Please inspect to collect photos.
No shipping kits have been installed on the tool.
Chamber for OX, Non Metal. Power rating: 200 AC3-phase.
Missing or damaged parts: Fab15 confirmed there were no missing or damaged parts.
Position of GASBOX is unique. Please check it in a photo.
(1 Chamber); Process OX. It has been removed from tool and is stored in clean room.
1 CHAMBER ONLY.
| Tool Model | Vigus RK3 |
| Process | OX |
| Software Version | Ver5.35-Rev502-STD-5.35a |
| System Power Rating | 200VAC 3-Phase |
| Chm Position 1 | TACTRAS Vigus RK3 | Ar/H2/C4F8/O2/CF4/CHF3/CH2F2/CO/N2/C4F6/COS | |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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