Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

LAM Research 2300 Exelan Flex EX+

Asset ID: 204415

Print spec sheet

LAM Research

2300 Exelan Flex EX+

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: Please see

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 5/28/2021

Please see the following serial number on an individual chamber.

PM1 SN F148252 (MFG 2013)

PM2 SN F148253 (MFG 2013)

PM1 SN F147564 (MFG 2012)


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.


[Chamber A]

Chamber type:Flex EX+

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃


[Chamber B]

Chamber type:Flex EX+

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃


[Chamber C]

Chamber type:Flex EX+

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃



Other missing or damaged parts: Not reported.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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