Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Etch/Ash/Clean - Plasma Processing
Date of Manufacture: July 2011
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Tool has been de-installed and is stored in an off-site warehouse.
Fab15 confirmed Six (6) bottom chillers are not included in tool for sale.
Missing or defective parts status: Please see check below.
All chambers are a HARC Chamber.
|System Power Rating||200 AC3-Phase for System|
|Loading Configuration||3 load port|
|Chm/Unit Position 1||Loader Module|
|Chm/Unit Position 2||VTM|
|Chm/Unit Position 3||Purge storage|
|Chm/Unit Position 4, 5, 6, 7, 8, 9||Process Module VIGUS|
Device-net I/F Type (Fujikin)|
13 + 3(Edge-Add-Gas)
TM/LLM PUMP：MU100U-147 (KASHIYAMA)
|Description||Missing (Qty)||Defective (Qty)|
|TM/LLM DRY PUMP||1|
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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