Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Centura AP Ultima X

Asset ID: 145566

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Applied Materials (AMAT)

Centura AP Ultima X

HDP CVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 9/30/2022

Tool is operating in clean room.

Shipping brackets and kits will need to be supplied by buyer.

Buyer is responsible for arranging disassembly and rigging for tool.

Missing or damaged parts: Not reported. Please inspect to confirm.


[Chambers A, B and C)
Chamber Type: Ultima X HDP CVD
Gas Config(sccm)=MFC Full Scale
O2(1000)/NF3(100)/HE(600)/SiH4(300)/H2(1000)/AR(1000)/SiH4(50)/HE(400)/AR(100)/NF3(3000)/AR(3000)
RF Source  1.8-2.17MHz, max  10000 W
RF Bias      13.56MHz, max   9500W
RF RPS      400kHz, max 6000W


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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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