Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Dainippon Screen Mfg. Co. SS-3000

Asset ID: 206035

Print spec sheet

Dainippon Screen Mfg. Co.

SS-3000

Wafer Scrubber

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture: July 25, 2007

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

WET 15-3DNS_SS3F2B2CLN DNS SS3F


Tool has been de-installed and is stored in an off-site warehouse.


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.

OTHER MISSING OR DAMAGED PARTS: NOT REPORTED.

No photos provided. Please inspect to collect photos.



[Chamber A]

 Process : Wafer surface clean

 Chuck : Vacuum Chuck

 SPRAY : Soft Spray N2 10~100NL/min 

 Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

 Spin DRY : 3000rpm Spin Dry only


[Chamber B]

Process : Wafer surface clean

 Chuck : Vacuum Chuck

 SPRAY : Soft Spray N2 10~100NL/min 

 Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

 Spin DRY : 3000rpm Spin Dry only


[Chamber C]

Process : Wafer Backside clean

 Chuck : Mechanical Chuck

 SPRAY : Soft Spray N2 10~200NL/min

 Burush : PVA Burush 

 Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

 Spin DRY : 2400rpm Spin Dry only


[Chamber D]

Process : Wafer Backside clean

 Chuck : Mechanical Chuck

 SPRAY : Soft Spray N2 10~200NL/min

 Burush : PVA Burush 

 Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

 Spin DRY : 2400rpm Spin Dry only

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