Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
Endura II Front-End Metallization
PVD (Physical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
ME ID# 67046 WNENB7A100 AMAT tool config
Tool config is based on original PO, please verify tool details at tool inspection
Process: PVD_W
Software Version: CGA enB210440
System Power Rating: 08V-U, 208V-N, 480V-N
Loading Configuration: 3 loadport
Chm Position 2: CIPW; Chamber Chemicals Gases Used: N2,Ar
Chm Position 3: CIPW; Chamber Chemicals Gases Used: N2,Ar
Chm Position 4: CIPW; Chamber Chemicals Gases Used: N2,Ar
Chm Position E: Degas; Chamber Chemicals Gases Used: Ar
Chm Position F: Degas; Chamber Chemicals Gases Used: Ar
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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