Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
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Centura AP AdvantEdge G5 Metal
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: December 25, 2013
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Tool has been de-installed and is stored in an off-site warehouse.
Missing or damaged parts: Fab15 confirmed Qty 2 of SINGLE RING CERAMIC .50 HEIGHT 300MM HTD ESC (consumable items) are missing.
Please inspect to confirm any other missing or damaged parts.
|Tool Model||Centura AP AdvancedEdge G5|
|Sending Site Workstation Name||15-3AMAT_ADVTG5_W2|
|Software Version (include revision #)||AMS 2.8_82|
|System Power Rating||208VAC 3-Phase|
|Loading Configuration||2 Carrier Stage|
|Tool under OEM service contract?||No|
|Vendor Chm Model||Chemicals / Gases Used (not to use Micron Proprietary names)|
|Chm/Unit Position 1||Centura G5||'BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43|
|Chm/Unit Position 2||Centura G5||'BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43|
|Chm/Unit Position 3||Centura Asp||CF4/O2/N2|
|Chm/Unit Position 4||Centura Asp||CF4/O2/N2|
|Tool:Centura Advantedge G5|
|Process Unit:Advantedge G5||Model:Centura||Remark|
|MFC/Pressure Unit: MILLIPORE IntelliFlow(DeviceNet)|
|Drive Mechanisms:GUI PC|
|FOUP Opener: ADO|
|Gas System:Device Net|
|*All OEM cable connecting between FAB to SubFab are require to be list out (Include length in mm)|
|Main AC Rack||1|
|Secondary AC Rack||1|
|Side strage Left||1|
|Side strage Right||1|
Tool is configured with endpoint.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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