Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Tokyo Electron Ltd. (TEL) CLEAN TRACK ACT 12

Asset ID: 41510

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Tokyo Electron Ltd. (TEL)

CLEAN TRACK ACT 12

Coat only Track

Resist Processing Equipment

Equipment details:

Date of Manufacture: 2004

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Tool config is based on original PO, please verify tool details at tool inspection


Process: COATER (i-Line)

Software Version: 3.04.110

System Power Rating: 208 AC 3-Phase for System

Loading Configuration : 4 Loaders (FOUP) / LEFT


Configuration Summary: - 4 COT, 9 LHP, 6 HHP and 4 PHP modules


TEL Photoresist Processing System

- ACT12 Main Body , Qty 1

- FOUP Carrier Station 1 X 4 side loading, Qty 1

- Process Station Block , Qty 2

 - Photo Resist Coater Units (COT): 4 Cups

 - Wafer Edge Exposure (WEE): 1 module

 - Adhesion Process (ADH): 2 units

 - Low Temperature Hot Plate (LHP): 9 Plates

 - High Temperature Hot Plate (HHP): 6 Plates

  - Precision Hot Plate (PHP): 4 Plates

 - Chill Plate (CPL): 9 Plates

- AC Power Box, Qty 1

- External Chemical Cabinets, Qty 2

 - Bulk Solvent Delivery with 20L back-up cannister

- Cup T&H Controller, Qty 1

- Temperature Controller, Qty 2


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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