Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
Date of Manufacture: May, 2004
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Shipping brackets and kits will need to be supplied by buyer.
Buyer is responsible for arranging disassembly and rigging for tool.
[Bath 1]
DHF(1:500)(20deg,15l/min)
Bath material :PTFE
Chuck material :PCTFE
[Bath 2]
Cold DIW rinse(25deg,40l/min)
Bath material :PTFE
Chuck material :PCTFE
Megasonic :2400W
[Bath 3]
DHF(1:500)(20deg,15l/min)
Bath material :PTFE
Chuck material :PCTFE
[Bath 4]
Cold DIW rinse(25deg,40l/min)
Bath material :PTFE
Chuck material :PCTFE
Megasonic :2400W
[Bath 5]
DHF(1:500)(20deg,15l/min)
Bath material :PTFE
Chuck material :PCTFE
[Bath 6]
Cold DIW rinse(25deg,40l/min)
Bath material :PTFE
Chuck material :PCTFE
Megasonic :2400W
DRYER1
type SD2
1:200DHF
IPA/N2 200deg
100l/min
Missing or damaged parts: Not reported. Please inspect to confirm.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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